二手 SEMIX / TAZMO TR 6133UD #293598589 待售
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ID: 293598589
晶圆大小: 4"-6"
Coater systems, 4"-6"
(3) Zone hotplate
Single / double cassette
Fluoroware type with pitch of 3/16" for (25) Wafers
SOG Nozzles: 0.85mm, 1/16" tubing
Nozzle capping mechanism
Nozzle cleaning with solvent
Splash back cup cleaning with solvent
Adjustable suck back valve
Polypropylene tank: 1 gallon
PVC, 11"
Teflon solvent tubing and suck back valve
(3) Vacuum chuck hot plates
Heater capacity: 3.8 Kw (total) at 250°C
Baking time: 0-999.9 secs with increments of 0.1 sec
Normal indicator setting: ±3°C
SOG Filter: .22 µm Fluoropore fitter
Chemical cabinet: 5 Gallon capacity
(2) Nozzles back side rinses (edge bead removal)
Solvent filter: MILLIPORE CWFG00403 Fluorex / WGFG04HP6 Wafergard
Gas line filter: MILLIPORE GTL WGFG01D Wafergard 0.22 µm filter
Wafer transport system:
Indexing elevator
Vacuum chuck
Shuttle mechanism
Walking beam
Control unit:
Microprocessor: INTEL 8065 (main and (2) sub CPUs)
Speed: 100-9000 RPM (4") / 8000 RPM (6") ± .15% (50-1990 RPM) and ±.1% (2000-6000 RPM) Alarm for speed ±3% of RPM (speed higher than 300 RPM)
Acceleration: Maximum rate 1 sec for 0 to 5000 RPM (programmable in increments of 1 sec)
Process: 20-Steps, 8 / 16 recipes
Temperature control: ±1°C Uniformity with alarm setting of ±3°C
Spinning, dispensing time: 0-99 Sec programmable
Baking time: 0-999 Sec programmable
Process display: Back-lit LCD.
SEMIX/TAZMO TR 6133UD是一种全自动、用途广泛的光刻设备,可用于广泛的工业应用。它的设计考虑到了光刻技术,能够产生深蚀刻,平面化和高分辨率图样到0.5微米的分辨率。主机由数字控制台和真空台组成。控制台操作真空台的微米刻度X、Y、Z轴,对光刻胶图桉进行精确对准定位。真空台还包含一个可编程曝光室和一个自动装卸光刻胶的分配系统。SEMIX TR 6133UD提供了一系列功能,包括数字图像记录器、分配和驱动器控制、晶圆切换单元和真空机。图像记录器记录所需的绿光曝光模式,然后用于驱动X、Y和Z轴的运动控制。利用分配和驱动控制来精确控制光刻胶在制图过程中的流动和微米尺度级的运行。晶片移转工具有助于在设备和加工室之间传输光刻涂层晶片。真空资产有助于确保高分辨率图样的均匀清洁表面。TAZMO TR 6133UD提供优异的性能,可重复性10微米,高分辨率0.5微米。此外,该模型还拥有广泛的支持设备,以帮助开发基于光刻胶的设备和产品。这包括自动分配工具、高速扫描工具、光敏溅射系统和一系列基于光敏的沉积系统。TR 6133UD是一种先进的光刻设备,它提供高分辨率的阵列功能、出色的可重复性和广泛的支持工具。它旨在满足需要光刻程序的工业应用的需要,并且能够在很小的时间内提供高精度的结果。
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