二手 SVG 88 Series #9033562 待售
网址复制成功!
ID: 9033562
Track system, 6"
Wafer: 6" glass
Wafer dual Track, 6"
Wafer flow: Left to Right
Transport wafer: ATS arm
Software have 99 process program capability with up to 9 event per program
Can "link" two or more programs together to create longer programs
Intergrades components exercise for system maintenance
Real time displaying motor speed
Capable to save or re-stored recipe and option data into CPU flash when CPU need repair
Auto calibration HPO wafer carrier motor
Full "2-way" diagnostics
Full range of programmable options
All modules grounded to Copper bar ground 1” X ¼” X 80”, “Copper bar ground” grounded to facility ground discharge static, clean signal
Coater Process: Moving/pivoting arm dispense with (3) dispense capability
Developer process: Moving dispense arm with 2 sprays, 2 stream nozzle, Air ring, top rinse and back side rinse
Track 1: Send-Vapor Prime-Chill-Coat-bake-Chill-Receive
Track 2: Send-Bake-Chill-Develop-Bake-Chill-Receive
Track 3: Send-Send - Coat-Bake - Receive-Receive
Track 4: Send-Send - Coat-Bake - Receive-Receive
Indexer Assembly:
Banner wafer sensor or Capacitive sensor
Grey Teflon coat platform
3/16" or 1/4" pitch (for 25 or 20 wafer cassettes)
Coater Assembly:
Moving/pivoting dispense assembly with 3 dispense capability
Peek material wafer chuck
Top EBR
Bottom EBR
Top, bottom EBR, catch cup rinse, tub fill (fill Pre-dispense cup by option select timing to prevent dispense nozzle dry off at home position, idle mode)
Upgraded Centering unit with dual cylinder shaft
Digital pressure (vacuum) switch
Sub-micron servo motor using brushless motor with Pacific Scientific controller max 6500 RPM +/-1 RPM no need calibration
Flat finder, wafer run smooth at high speed
Upgraded Stepper motor up/down 3 position Assy. for Spindle replace 3 position cylinder more stable, reliable
1 upgrade Cybor pump /each track
1 five gallon canister for EBR
1 five gallon canister for CCR
1 three gallon canister for Tub fill
CKD valve replacement for high cost, obsolete valve for Spindle valve assembly
Catch cup Assembly is easily removable, cleanable, also catch cup have the catch cup rinse assembly, clean itself by option select to set catch cup wash wafer count, catch cup wash time interval
Tub fill pre-dispense cup by option select fill solvent to the cup by timing prevent nozzle dry off when track at idle position, option select purge the dispense nozzle clean the tip itself before process, amount is equal amount to real process
High purity Teflon tubing for fluid line, dispense line
High level sensor for coater drain jar work with software
Low level sensor for Photo Resist bottle work with software
Low level sensor for EBR canister work with software
Developer Assembly:
Moving dispense arm Assembly with 2 spray, 2 stream nozzle
Peek material wafer chuck
Sub-micron servo motor using brushless motor with Pacific Scientific controller Max 6500RPM +/-1RPM no need calibration
Top rinse and backside rinse and air ring
Three way Teflon valve for DI water return for top rinse prevent particle build up
Digital vacuum switch
Upgraded Stepper motor up/down 3 position Assy. for Spindle replace 3 position cylinder
Flat finder, wafer run smooth at high speed
Cooling jacket for Developer fluid line,
CKD valve replacement for high cost, obsolete valve for Spindle valve assembly
Vapor Prime Assembly:
Stainless steel exhaust
Contact or proximity control bake with lid up
Vacuum or HMDS bake with lid down
All Teflon dispense lines
Pressure canister for HMDS
Hard clear anodized lid
Digital pressure (vacuum switch)
Cast-in heat element 450 W
Capable of operating at temperature ranging from 50 degree C to 400 degree C in dehydration bake cycle and to 200 degree C in vapor prime cycle
RTD temperature probe with 0.1 degree C increment readout
Remote digital temperature controller
Watlow EZ zone controller
Dual digital LED display
Auto tuning, +/-0.1% calibration accuracy
PID control-no drift or shifting
Temperature uniformity under +/- 2 degree C
Hot Plate Oven Assembly:
Stainless steel exhaust
Hard clear anodized HPO block
Three pin wafer lift assembly
HPO block with side-mounted vacuum port-guaranteed no leak
Contact or proximity control bake
Cast-in heater elements 450W
Watlow EZ zone Temperature controller
Dual digital LED display
Auto tuning, ±0.1% calibration accuracy
PID control – no drift or shifting
Temperature uniformity under ±2°C
RTD temperature probe with 0.1°C increment readout
HPO temperature range from 50°C to 400°C
Digital pressure (vacuum) switch
Remote digital temperature controller
Chill Plate Assembly:
Hard clear anodized chill plate
Three pin wafer lift assembly
Digital pressure (vacuum) switch
Power: 208VAC, 3 phase, 60Hz.
SVG 88系列光刻胶是由SVG America创造的专用设备,用于印刷行业。该系统设计用于在纸张、布、膜、箔、柔性基板等基板上提供可靠、耐用和精确的光刻材料涂层。88系列光刻胶单元由一个可更换的喷嘴式涂抹器、一个内置模式生成单元的控制器和一个能够分配所需精确数量光刻胶的平台组成。该机器能够制造单层和多层涂层。喷涂器使用静电沉积光敏材料,可以精确调节,确保在基板上沉积均匀的层。SVG 88系列光致抗蚀剂工具的设计具有很高的可靠性和耐用性.该资产经认证可用于恶劣环境,可安全用于各种工业部门。该模型旨在每次提供准确的结果,并利用先进的软件帮助保持基板温度的一致性。该设备还能够产生各种图桉,使其成为各种印刷应用的可行补充。使用该系统,可以复制图像的多个副本或简单地应用单层或多层覆盖。该单元还能够实现模式的精确配准,这意味着在铺设抗蚀剂时不会发生重迭。88系列光刻机也在设计时考虑到了用户友好的界面。该工具易于调整和控制,不需要复杂的设置。该资产能够创建广泛的模式,因此用户可以轻松调整设置以获得最佳结果。此外,该模型是完全自动化的,允许高效操作,并且能够自我校准以提高精度。总之,SVG 88系列光刻设备是一种可靠、耐用的系统,设计用于各种印刷应用。该装置的设计可提供准确和可重复的涂层,并且完全自动化,以便高效运行。该机器能够创建多种模式,而且用户友好,不需要复杂的设置。
还没有评论