二手 TEL / TOKYO ELECTRON ACT 12 #9164503 待售

DUV coater / developer, 8" Dual block track for S204 Utilized with Nikon S204 Scanner Exposure Tool iUSC SECSI, SECSII, HSMS, & GEM Interface Compatibility 4 Blocks Interfaced: Cassette-2 Process Blocks-Scanner Interface 4 Wafer Transfer Robot Arms: Cassette-2 Process Blocks-Scanner Interface Control Module on Cassette End-Station (CES) Interface Block: Single-pincette shared wafer transfer with centering guides Standard wafer arm and interface panel to accommodate stepper/scanner Interface includes a CPL for insuring consistent wafer temps into the stepper/scanner 2 Coaters (COT): 4 resist nozzles with temperature control 16 layer resist and solvent filters RRC Pumps 4L or 1L Nowpak capability SS 0.3mm diameter side rinse nozzle with flow meter 2 SS 0.3mm diameter back rinse nozzles 4 Developers (DEV): 2 “H” nozzles with temperature control per cup 16 layer developer filter Bulk-FSI system for developer 2 Adhesion Process Stations (ADH): Half sealed chamber with dispersion plate for HMDS 6 Chill Plate Process Stations with temperature control (CPL) 1 Transfer Chill Plate (TCP) 8 Low Temperature Hot Plate Process Stations with temperature control (LHP) 4 Chilling Hot Plate Process Stations (CHP) 1 Wafer Edge Exposure Process Station (WEE) DUV illumination monitor on lamp housing Uses a 250W ultra pressure Mercury lamp with 5x4mm illumination pattern Subcomponents: Fluid Temperature Controller Temperature & Humidity Controller - 2x Chemical Cabinet AC Power Box 2001 vintage.