二手 TEL / TOKYO ELECTRON ACT 8 #9235266 待售

System, 8" Wafer flow: Left to right Wafer type: Notch / Flat Cassette block (CSB): Open type Process block (PRB): 1 Block Interface block (IFB) CANON FPA-3000 i5 Exposure system Chemical box: Solvent: (2) Buffer tanks and degas module HMDS: Buffer tank and canister tank Solution: (2) Buffer tanks and (2) Degas modules Drain: COT Drain poly tank With fire extinguisher system Temperature and humidity 1: COSAM SPA-Series No temperature and humidity 2 Temperature control unit (TCU) 1: INR Series AC Power box No back-up module in AC power box (7) Parts boxes Missing part in AC box Cassette block (CSB): No ULPA fan unit Display panel Alarm tower Loader No carrier reader sensor CRA: X, Y, TH, Z Motor set X, Y, TH, Z Drive set Tweezer Mapping sensor Wafer check sensor No AGV system MSE 343B DC Power box CSB Chemical area: Resist pump: (8) T-F200 Series RRC Pumps Resist bottle: Gallon bottle and quart bottle Resist filter: (4) Impact type (4) Housing type (8) LE Tanks: 200cc Process block (PRB) 2: FAN Unit TH Drive PRA: X1, 2, 3, Z Motor and drive Pincette and wafer block Wafer sensor Coater (COT): (4) Dispense nozzles Nozzle arm 1 and 2 Chuck Back rinse nozzle No BARC coater (COT) TARC Coater (TCT): (2) Dispense nozzles Nozzle arm 1 and 2 Chuck Back rinse nozzle CUP Set Developer (DEV): Dispense nozzle: H Nozzle Nozzle arm 1 and 2 Chuck Back rinse nozzle CUP Set Process block (PRB) 2: Oven ADH LHP No HHP No HCH CPL No PHP No PCH CHP No TCP TRS CWH IFB (Interface block): FAN Unit EIS Type: CANON IRA: X, TH, Y, Z Motor and drive Tweezer and wafer block Wafer sensor WEE: X Motor and drive Chuck Exposure type: DUV-Line Exposure sensor: 254 UV.