二手 TEL / TOKYO ELECTRON ACT 8 #9312079 待售
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ID: 9312079
晶圆大小: 8"
优质的: 2007
(4) Coater / (4) Developer system, 8"
(2) Chemical boxes
(2) SMC Thermo controllers
TEAM KOREA Temperature and humidity controller
AC Power box
Left to right
Wafer and carrier type: Notch
(25) Slots
(4) Uni-cassette loaders
Carrier station:
Type: Normal uni-cassette
(4) Cassette stages
Pick-up cassette
Uni-cassette system
Coater unit (2-1, 2-2, 2-3, 2-4 Module):
(3) Dispense nozzles with temperature controlled line
RDS Pump
Rinse nozzle: Back / EBR / Solvent bath
Rinse system: 3 Liters (2) buffer tank systems
PR Suck-back valve type: AMC Suck-back valve
Programmable side rinse
Direct drain
Developer unit (3-1, 3-2, 3-3, 3-4 Module):
Nozzle for each unit
2-Stream nozzles for DI rinse
2-Points for back side rinse on each unit
Developer system: 3 Liters (2) buffer tank systems
Developer temperature control system
Direct drain
(2) Adhesion units:
Sealing closed chamber with built-in hot plate
HMDS Tank with float sensor
Interface type: NIKON
High temperature hot plate
(16) Low temp hot plates
(9) Chill Plates (CPL)
(4) Chilling Hot Plate (CHP) process station
(3) Transition Stage (TRS) modules
Transition Chill Plate (TCP) module
Wafer Edge Exposure (WEE) module
(2) Temperature control units
Missing parts:
Main controller
(4) Coater cups (2-1, 2-2, 2-3, 2-4)
(3) Developer cups (3-1, 3-2, 3-3)
Main display panel
CRA X-Axis motor
CSB Add on board
(9) Coater PR pumps (2-1.2-2.2-3)
IRA Y-Axis motor driver
IRA Tweezers
LHP Module cover
Power: AC 208 V, 3 Phase
2007 vintage.
TEL/TOKYO ELECTRON ACT 8是一款为光刻胶应用而设计的先进曝光设备。它是一种激光驱动系统,利用高分辨率和精确的曝光时间控制来减少遮罩缺陷,增加曝光的光刻胶图像的一致性。这种光敏单元由激光源、调制器单元、扫描单元、分析仪单元和光敏图像检测器组成。激光源产生用于曝光光刻胶的光子。这可以是He-Cd,也可以是氙离子类型。调制器确保每个激光脉冲具有完全相同的持续时间,允许精确控制功率密度并提供均匀的10ns曝光。扫描机采用高精度、刚性的机械设计,对光刻胶进行精确曝光。它以1.2米/秒的速度扫描XY电机驱动级运行。分析仪使用CCD传感器来确认光刻胶图像的精确曝光。光致抗蚀剂图像检测器允许对极精确的抗蚀剂图样进行与偏转无关的测量。它结合了测量阶段、数据输入控制单元和信号输出显示单元。它可以检测到小至0.2微米的位置误差。TEL ACT 8适用于半导体制造等多种行业。它使芯片制造商能够快速、准确地生产分辨率更高的设备,并消除了掩模翻转。这种先进的工具能够达到0.1微米的打印精度。它还具有高速处理大型产品的能力,具有极好的资源利用率。
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