二手 TEL / TOKYO ELECTRON ACT 8 #9312079 待售

製造商
TEL / TOKYO ELECTRON
模型
ACT 8
ID: 9312079
晶圆大小: 8"
优质的: 2007
(4) Coater / (4) Developer system, 8" (2) Chemical boxes (2) SMC Thermo controllers TEAM KOREA Temperature and humidity controller AC Power box Left to right Wafer and carrier type: Notch (25) Slots (4) Uni-cassette loaders Carrier station: Type: Normal uni-cassette (4) Cassette stages Pick-up cassette Uni-cassette system Coater unit (2-1, 2-2, 2-3, 2-4 Module): (3) Dispense nozzles with temperature controlled line RDS Pump Rinse nozzle: Back / EBR / Solvent bath Rinse system: 3 Liters (2) buffer tank systems PR Suck-back valve type: AMC Suck-back valve Programmable side rinse Direct drain Developer unit (3-1, 3-2, 3-3, 3-4 Module): Nozzle for each unit 2-Stream nozzles for DI rinse 2-Points for back side rinse on each unit Developer system: 3 Liters (2) buffer tank systems Developer temperature control system Direct drain (2) Adhesion units: Sealing closed chamber with built-in hot plate HMDS Tank with float sensor Interface type: NIKON High temperature hot plate (16) Low temp hot plates (9) Chill Plates (CPL) (4) Chilling Hot Plate (CHP) process station (3) Transition Stage (TRS) modules Transition Chill Plate (TCP) module Wafer Edge Exposure (WEE) module (2) Temperature control units Missing parts: Main controller (4) Coater cups (2-1, 2-2, 2-3, 2-4) (3) Developer cups (3-1, 3-2, 3-3) Main display panel CRA X-Axis motor CSB Add on board (9) Coater PR pumps (2-1.2-2.2-3) IRA Y-Axis motor driver IRA Tweezers LHP Module cover Power: AC 208 V, 3 Phase 2007 vintage.
TEL/TOKYO ELECTRON ACT 8是一款为光刻胶应用而设计的先进曝光设备。它是一种激光驱动系统,利用高分辨率和精确的曝光时间控制来减少遮罩缺陷,增加曝光的光刻胶图像的一致性。这种光敏单元由激光源、调制器单元、扫描单元、分析仪单元和光敏图像检测器组成。激光源产生用于曝光光刻胶的光子。这可以是He-Cd,也可以是氙离子类型。调制器确保每个激光脉冲具有完全相同的持续时间,允许精确控制功率密度并提供均匀的10ns曝光。扫描机采用高精度、刚性的机械设计,对光刻胶进行精确曝光。它以1.2米/秒的速度扫描XY电机驱动级运行。分析仪使用CCD传感器来确认光刻胶图像的精确曝光。光致抗蚀剂图像检测器允许对极精确的抗蚀剂图样进行与偏转无关的测量。它结合了测量阶段、数据输入控制单元和信号输出显示单元。它可以检测到小至0.2微米的位置误差。TEL ACT 8适用于半导体制造等多种行业。它使芯片制造商能够快速、准确地生产分辨率更高的设备,并消除了掩模翻转。这种先进的工具能够达到0.1微米的打印精度。它还具有高速处理大型产品的能力,具有极好的资源利用率。
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