二手 TEL / TOKYO ELECTRON ACT 8 #9357239 待售

製造商
TEL / TOKYO ELECTRON
模型
ACT 8
ID: 9357239
晶圆大小: 8"
优质的: 2001
Coater / Developer system, 8" Main frame with controller Carrier station: Type: Normal uni-cassette (4) Cassette stages Pickup cassette Coater: (3) Dispense nozzle with temperature controller for etcher RRC Pump Rinse nozzle: Back / EBR / Solvent bath for etch unit Rinse: (2) Buffer tanks: 3 Liter PR Suck-back valve Direct drain TARC Coater: (2) Dispense nozzle with temperature controller for etcher RRC Pump Rinse nozzle: Back / EBR / Solvent bath Rinse: (2) Buffer tanks: 3 Liters PR Suck-back valve Direct drain Developer: SH Nozzle (2) Stream nozzles for DI rinse (2) Buffer tanks: 3 Liters Temperature controller Direct drain (3) Adhesions: 100% Sealing closed chamber (Built-in hot plate) HMDS Tank with float sensor (15) Low Temperature Hot Plates (LHP) (14) Chill Plates (CPL) TCP Module (3) TRS Modules Wafer Edge Exposure (WEE) module: Wafer type: Notch, DUV Notch DUV Chemical cabinet 1: Solvent and developer Chemical cabinet 2: PR and HMDS (2) TEL OEM Temperature controllers AC Power box Interface Missing parts: 2-1 COT Spin I/O Board 2-4 COT EBR Nozzle tip 2-4 COT EBR Nozzle valve 2-1 Nozzle changer motor 3-2 Shutter cylinder (2) PRB YASUKAWA Spin motor drivers 2-0 PRA Z-Driver 3-0 PRA Z-Driver Temperature and humidity controller (For 4 chu) Hard Disk Drive (HDD) 2001 vintage.
TEL/TOKYO ELECTRON ACT 8是一种最先进的光敏设备。它旨在提供业界领先的光刻工艺精度和精确度。光刻是制造许多电子元件的关键一步。TEL ACT 8系统利用高精度掩模对准器将图样精确地传递到光刻材料上。图样以较高的速度和精度传递到基材上。TOKYO ELECTRON ACT 8具有强大的步进电机和专有的控制单元。这样可以使掩模与基板快速而精确地对齐。掩模对准器的分辨率为25纳米,提供了高精度和重复性。该机还能对面膜进行图像处理,并能根据图桉的复杂性控制每一层的光剂量。ACT 8还配备了强大的洁净室环境。空气被过滤和控制到非常高的程度。这确保即使是最脆弱和微型的部件也不会受到任何污染。清洁室还有助于控制湿度,这对于控制光刻胶的曝光率很重要。TOKYO ELECTRON ACT 8还配备了用于控制整个工具的高级软件。该软件能够以各种模式控制光照。它还能够控制基板和面膜的温度,这对于控制光敏胶的收缩很重要。TEL/TOKYO ELECTRON ACT 8是一种高度灵活、精确的光致抗蚀剂资产。能够生产高质量、高可重复性的零件。强大的电机和先进的软件使得生产高吞吐量的精密零件成为可能。精密的环境控制确保即使是最精细的部件也不会受到污染。该模型是为小部件的大批量生产而设计的。
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