二手 TEL / TOKYO ELECTRON ACT 8 #9357239 待售
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ID: 9357239
晶圆大小: 8"
优质的: 2001
Coater / Developer system, 8"
Main frame with controller
Carrier station:
Type: Normal uni-cassette
(4) Cassette stages
Pickup cassette
Coater:
(3) Dispense nozzle with temperature controller for etcher
RRC Pump
Rinse nozzle: Back / EBR / Solvent bath for etch unit
Rinse:
(2) Buffer tanks: 3 Liter
PR Suck-back valve
Direct drain
TARC Coater:
(2) Dispense nozzle with temperature controller for etcher
RRC Pump
Rinse nozzle: Back / EBR / Solvent bath
Rinse:
(2) Buffer tanks: 3 Liters
PR Suck-back valve
Direct drain
Developer:
SH Nozzle
(2) Stream nozzles for DI rinse
(2) Buffer tanks: 3 Liters
Temperature controller
Direct drain
(3) Adhesions:
100% Sealing closed chamber (Built-in hot plate)
HMDS Tank with float sensor
(15) Low Temperature Hot Plates (LHP)
(14) Chill Plates (CPL)
TCP Module
(3) TRS Modules
Wafer Edge Exposure (WEE) module:
Wafer type: Notch, DUV
Notch
DUV
Chemical cabinet 1: Solvent and developer
Chemical cabinet 2: PR and HMDS
(2) TEL OEM Temperature controllers
AC Power box
Interface
Missing parts:
2-1 COT Spin I/O Board
2-4 COT EBR Nozzle tip
2-4 COT EBR Nozzle valve
2-1 Nozzle changer motor
3-2 Shutter cylinder
(2) PRB YASUKAWA Spin motor drivers
2-0 PRA Z-Driver
3-0 PRA Z-Driver
Temperature and humidity controller (For 4 chu)
Hard Disk Drive (HDD)
2001 vintage.
TEL/TOKYO ELECTRON ACT 8是一种最先进的光敏设备。它旨在提供业界领先的光刻工艺精度和精确度。光刻是制造许多电子元件的关键一步。TEL ACT 8系统利用高精度掩模对准器将图样精确地传递到光刻材料上。图样以较高的速度和精度传递到基材上。TOKYO ELECTRON ACT 8具有强大的步进电机和专有的控制单元。这样可以使掩模与基板快速而精确地对齐。掩模对准器的分辨率为25纳米,提供了高精度和重复性。该机还能对面膜进行图像处理,并能根据图桉的复杂性控制每一层的光剂量。ACT 8还配备了强大的洁净室环境。空气被过滤和控制到非常高的程度。这确保即使是最脆弱和微型的部件也不会受到任何污染。清洁室还有助于控制湿度,这对于控制光刻胶的曝光率很重要。TOKYO ELECTRON ACT 8还配备了用于控制整个工具的高级软件。该软件能够以各种模式控制光照。它还能够控制基板和面膜的温度,这对于控制光敏胶的收缩很重要。TEL/TOKYO ELECTRON ACT 8是一种高度灵活、精确的光致抗蚀剂资产。能够生产高质量、高可重复性的零件。强大的电机和先进的软件使得生产高吞吐量的精密零件成为可能。精密的环境控制确保即使是最精细的部件也不会受到污染。该模型是为小部件的大批量生产而设计的。
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