二手 TEL / TOKYO ELECTRON Clean Track ACT 12 #293604842 待售
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ID: 293604842
晶圆大小: 12"
优质的: 2008
Coater / Developer system, 12"
AC Power box
AC Power cable: 3 Phase
SHINWA T & H
Chemical cabinet: COT + DEV
(4) Coater units
(4) Develop units
(12) LHP Units
(2) HHP Units
(9) PHP Units
(9) CPL Units
(3) ADH Units
WEE Unit
(5) PEB Units
IRA Block
CSB
TCU
Coater unit:
Unit 1:
HPT Resist pump
EBR / RRC / BSR: EBR + RRC + Back rinse
Temperature / Humidity sensor
Photo resist temperature controller
Motor flange temperature controller
Unit 2:
(5) Resist nozzles
Resist pump: HPT
EBR / RRC / BSR: EBR + RRC + Back rinse
Temp / Humidity sensor
PR Auto exchange system
Photo resist temperature controller
Motor flange temperature controller
FOC Center photo resist drain
Unit 3:
(5) Resist nozzles
Resist pump: HPT
EBR / RRC / BSR: EBR + RRC + Back rinse
Temp / Humidity sensor
PR Auto exchange system
Photo resist temperature controller
Motor flange temperature controller
FOC Center photo resist drain
Unit 4:
(5) Resist nozzles
HPT Resist pump
EBR / RRC / BSR: EBR + RRC + Back rinse
Temperature / Humidity sensor
PR Auto exchange system
Photo resist temperature controller
Motor flange temperature controller
FOC center photo resist drain
Develop unit:
Unit 1:
Spray H develop nozzle
Rinse left to right develop nozzle move
Developer temperature control
Auto damper
Auto dummy rinse
Cup type: STD DEV
Unit 2:
Spray H nozzle develop nozzle
Left to right develop nozzle
(2) Top rinses
Developer temperature control
Auto damper
Cup type: STD DEV
Unit 3:
Spray H nozzle develop nozzle
Left to right develop nozzle
(2) Top rinses
Developer temperature control
Auto damper
Auto dummy rinse
Cup type: STD DEV
Unit 4:
Spray H develop nozzle type
Left to right develop nozzle move type
(2) Top rinses
Developer temperature control
Auto damper
Auto dummy rainse
Cup type: STD DEV
Hard Disk Drive (HDD) not included
2008 vintage.
TEL/TOKYO ELECTRON Clean Track ACT 12是利用超高压清洁技术的光刻剥离设备。该系统能够去除光致抗蚀剂，而不会损坏基板，也不会产生微粒。Clean Track单元由于其超高压清洁技术,能够以最小的损坏从基板上去除光刻胶。这样可以确保基板不会因清洁过程而受损。除了超高压清洁技术外，机器还利用多种清洁机制从基板上清洗光刻胶。其中包括强大的CO2激光器、用于化学去除的雾化器、用于去除颗粒的晶圆清洁器以及用于机械作用的搅拌站。CO2激光器能够有选择地切除和去除基板上的光致抗蚀剂，而不会对底层造成损害。雾化器用于在基材上添加适当的化学溶液，溶解光刻胶并确保其被完全去除。晶圆清洁器设计用于清除清洁过程中基板上残留的任何颗粒。最后，搅拌站允许机械作用，进一步方便清洗过程。Clean Track工具还设计为提供自动化,从而实现高效和一致的结果。集成的控制资产和自动晶片处理可确保快速、准确地执行清洁过程。此外，真空泵技术还提供了较高的空气去除能力和快速干燥时间，确保从基板表面完全去除光致抗蚀剂。TEL Clean Track ACT 12模型是一种可靠高效的光敏剥离设备。它结合超高压清洁技术和其他清洁机制，为从基板上去除光刻胶提供了一个干净、准确、一致的系统。通过提供自动化、一致的结果,Clean Track单元可以帮助提高光刻工艺的效率,并使制造商能够生产更高质量的基板。
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