二手 TEL / TOKYO ELECTRON Clean Track ACT 8 #9191941 待售

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ID: 9191941
晶圆大小: 8"
优质的: 2015
Photoresist processing system, 8" Carrier station (CSB) With 1 x 4 loader Pick up stage Coater unit (COT) for resist coating Resist dispense line With TEL HPT Resist pump (LOR 10A) Adjustable suck-back valve Resist consumption feature Backside rinse Programmable topside edge bead remover Programmable dummy dispense Direct drain Yellow LED light module in spinner unit PTI Active mass flow control Polymide coater unit (PCT): Pressurized dispense system for polymide: Lit-lifting mechanism With pressure sensor system Backside rinse Programmable topside edge bead remover Programmable dummy dispense Direct drain Yellow LED light module in spinner unit PTI Active mass flow control Developer unit (DEV) for puddle develop Super H nozzle (TMAH) Top and backside rinse (DIW) Yellow LED light module in spinner unit Direct drain Polyimide developer unit (PI DEV): Spray nozzle set for spray develop (Cyclopentanon) Straight nozzle for puddle develop (Cyclopentanon) Spray nozzle set for spray rinse (PGMEA) Top and backside rinse (PGMEA) Yellow LED light module in spinner unit Direct drain Central Supply PCS (Pump chemical supply system) for Cyclopentanon With two-canister auto-switch system Central supply two-tank auto-supply system (PGMEA and TMAH) Thermal units: Chill plate process station (CPL) Low temperature hot plate process station (LHP) Heater cover hot plate process station (HCH) Transition stage (TRS) Transition chill plate (TCP) Cup washer holder (CWH) AC Power box: 208VAC Thermostatic water supply unit Side cabinet for polyimide & PGMEA Supply Chemical cabinet for Cyclopentanon & TMAH supply Cup temperature & humidity controller CP-2 (Coater & PI coater unit) CE Marked 2015 vintage.
TEL/TOKYO ELECTRON Clean Track ACT 8是一款先进的光刻设备,旨在提供卓越的洁净室性能和吞吐量。该系统采用一种自动跟踪装置,该装置结合了主动清洗工艺和无化学物质的光刻晶片储存和运输。经过优化的抗蚀剂供应机器进一步确保了高生产率、高均匀性和最小晶圆污染。TEL Clean Track ACT 8包括一个旨在抵抗颗粒沉积的敏感器工具。资产配备了多种功能以确保最佳性能。采用专门的涂层工艺,保证了光致抗蚀剂对晶片表面的优越附着力,保证了整个表面积的总覆盖率和均匀的薄膜厚度。自动模型识别晶片的大小并标识指定的抗蚀剂类型。模块化设备还具有灵活的容量,可以根据当前需求和晶圆尺寸进行即时调整。TOKYO ELECTRON CLEAN Track ACT 8的专有抵抗系统带来了几个优点。清洁液是一种水溶液,可最大限度地减少有机物质的引入,并在单位内按需产生。这确保进一步防止污染。预编程的液体消耗率优化了机器的高速加工。抗蚀剂供应工具保持密封状态,以保护暴露的抗蚀剂在任何时候都不受污染。此外,Clean Track ACT 8还配备了若干高级安全功能。内置的低压抵抗喷雾资产降低了暴露于空气中颗粒的风险,保护基片免受可能的污染。该模型还设计用于清洁环境中的卓越性能,并拥有更窄的操作范围,从0.2巴到0.6巴。TEL/TOKYO ELECTRON CLEAN Track ACT 8的独特设计允许提高通量和最小晶圆污染,实现包括硅、陶瓷和石英在内的多种基材的高产率。灵活的容量和自动化的流程使TEL Clean Track ACT 8成为清洁室操作的经济高效的解决方桉,而清洁室操作要求其光阻设备提供高性能。
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