二手 TEL / TOKYO ELECTRON Clean Track ACT 8 #9245118 待售

ID: 9245118
晶圆大小: 8"
优质的: 2002
(4) Coater / (4) Developer system, 8" (2) Chemical cabinets: Solvent and developer (2) SMC Thermo controllers: HMDS, PR YEST YIB-TP23 T and H Controller AC Power box MFC: 4-Ports Right to left Wafer type: Notch, DUV type DUV Type 25-Slots Loading configuration: (4) Loader uni-cassettes Carrier station: Type: Normal uni-cassette (4) Cassette stages Pick-up cassette Uni-cassette system Coater unit (2-1, 2-2, 2-3, 2-4 Module): (4) Dispense nozzles With temperature controlled lines RDS Pump Rinse nozzle: Back / EBR / Solvent bath Rinse system: 3 Liters (2) buffer tank systems PR Such-back valve type: AMC Suck-back valve Programmable side rinse Direct drain Developer unit (3-1, 3-2, 3-3, 3-4 Module): H Nozzle (2) Stream nozzles for DI rinse 2-Points for back side rinse / Unit Developer system: 3 Liters (2) buffer tank systems Developer temperature control system Direct drain (2) Adhesion units: 100% Sealing closed chamber (Built-in hot plate) HMDS Tank with float sensor Interface type: ASML (3) High temperature hot plates (15) Low temp hot plates (10) Chill plates (CPL) (4) Precision Hot Plate (PHP) process station (3) TRS Modules TCP Module Wafer Edge Exposure (WEE) module (2) TEL / TOKYO ELECTRON Temperature control units Main controller missing Power: AC 208 V, 3-Phase 2002 vintage.
TEL/TOKYO ELECTRON CLEAN Track ACT 8是一款完整的光刻设备,旨在提供高生产率、出色的迭加精度和卓越的重复性的精密光刻零件处理能力。该系统具有SIMOX工艺模块,用于干式抗蚀层开发,以及模块化添加模块,以满足更大规模的晶圆和半导体加工需求。该单元设计为单层、单室工艺,可实现简单、有效的抵抗处理。它具有一个精确控制的X-Y级,结合了一个创新的抵抗显示器,以降低噪音和提高性能。这台机器还采用了三重曝光处理模块,它提供了改进的边缘定义和边缘精度,因为它应用了一系列具有可调间隔时间的曝光。该工具利用先进的工艺控制技术,以确保在低光敏消耗水平下的最大精度。其专有的La Ra Revolution流程监视器还实时监控运行情况,允许在需要时快速纠正解决方桉。即使工艺条件不同,这也有助于确保结果的一致性。该资产还具有专有PROM(相片抵抗优化模块)软件,用于SEM窗口和OPC。此软件可精确计算每种结构类型的最佳条件,从而使制造分辨率更高的部件的错误更少。该型号还通过灵活的设备配置和在干净的轨道上安装增加了额外的便利。这使得它很容易适应一系列的生产需求。综上所述,TEL Clean Track ACT 8是一个完整的光刻胶系统,为用户提供出色的迭加精度和出色的重复性,同时提供简单的安装和灵活的单元定制。该机器提供先进的过程控制、改进的边缘定义和软件辅助零件优化,以提高分辨率,同时保持较低的光刻胶消耗水平。
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