二手 TEL / TOKYO ELECTRON Clean Track ACT 8 #9248792 待售
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ID: 9248792
晶圆大小: 8"
优质的: 1999
(2) Coater / (2) Developer system, 8"
Direction: Right to left
(25) Slots
(4) Uni-cassette loaders
Main controller: Type 2
CSB
PRB1
IFB
Power box
T&H Controller
Chemical box
Thermo controller
Main system:
Main frame with system controller
Carrier station:
Type: Normal uni-cassette
(4) Cassette stages
Pick-up cassette
Uni-cassette system
Coater unit (2-1, 2-2):
(4) Dispense nozzles with temperature controlled lines for etch unit
RRC Pump
Rinse nozzle: Back / EBR / Solvent bath for etch unit
Rinse system: 3 Liters (2) Tanks buffer tank system
P.R Suck-back valve type: Air operation suck-back valve
Programmable side rinse
Drain: Direct drain
Developer unit (2-3, 2-4):
Steam nozzle for each unit
(2) Stream nozzles for DI rinse and 2-points for back side rinse on each unit
Developer system: 3 Liters (2) tanks buffer tank system
Developer temperature control system
Drain: Direct drain
Interface type: ASML
(8) Low temperature hot plates (LHP)
(4) Chill plates (CPL)
(4) Chilling hot plate process stations (CHP)
TCP Module
(2) TRS Modules
WEE (wafer Edge Exposure) Module
Wafer type: Notch
Chemical cabinet
TEL / TOKYO ELECTRON Temperature Control Unit (TCU)
AC Power box
Missing parts:
2-5, 2-17 ADH Module assemblies
Circulator pump
IRA T Axis motor driver
WEE CCD Board
WEE X Axis motor driver
(2) 2-2 COT P.R Pumps
(2) Developer buffer tanks
2-2 Spin chuck
T&H Controller
Main controller hard disk
System power rating: AC 208V, 3-Phase
1999 vintage.
TEL/TOKYO ELECTRON CLEan Track ACT 8是一款用于半导体加工的先进光刻设备。它旨在在具有挑战性的细线流程中提供卓越的性能,尤其是在高级14 nm及以下流程节点中。TEL Clean Track ACT 8能够以高达8.4 m/s的速度运行,同时在整个基板表面保持均匀的层沉积。其先进的配电系统采用改良的液体门控技术（LGT）,可确保整个晶片表面均匀沉积薄膜。LGT还可实现更小的死带尺寸,同时提高流程吞吐量。TOKYO ELECTRON CLEAN TRACK ACT 8还有一个新的CozFlow Dispense Technology，它使用一个特殊的喷嘴来精确控制光刻胶的分配量和流动方向。这样可以提高薄膜沉积的精度。使用可选的Clean Track Precision Point Laser Unit可以进一步提升Clean Track ACT 8的性能。这种专有激光机器在晶片表面上应用光刻胶薄膜的精度和均匀性得到了提高，这种光刻胶薄膜采用的是固态激光器，经过调整以获得所需的抗蚀剂参数。从该工具获得的结果优于传统光学光刻技术。TEL/TOKYO ELECTRON CLEan Track ACT 8具有先进的自动化清洗资产，允许进行高对比度蚀刻工艺。这种清理模型旨在去除制造过程中使用的任何化学物质的残留物，并为进一步加工准备晶片。TEL Clean Track ACT 8还拥有许多其他功能,使其成为高级半导体工艺的理想解决方桉。其中包括：显示晶圆制造进度的集成实时过程监视器、易于操作的触摸屏,以及调整抗蚀膜宽度以适应所需图桉尺寸的能力。TOKYO ELECTRON Clean Track ACT 8的先进功能使其成为复杂而精确的半导体制造工艺的理想解决方桉,特别是对于先进的14 nm及以下工艺节点。通过使用Clean Track ACT 8,工程师和技术人员能够准确、统一地设计设计,同时实现一致的结果。
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