二手 TEL / TOKYO ELECTRON Clean Track Mark 8 #9158015 待售
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ID: 9158015
晶圆大小: 8"
优质的: 1997
(2) Coater / (3) Developer system, 8"
Dual block
Silicon substrate wafer
Wafer flow: Right to left
CSB Unit at right
Interface station unit at left
(2) Process blocks:
Cassette station block (CSB):
FC-9801F Controller
Stage / Indexer:
Non SMIF / Open uni-cassette
Cassette station (CS)
Cassette station arm (CSA)
PSB / Process station block (Spin units):
2-1 Standard photo resist coat unit:
(3) Photo resist dispense nozzles
(3) IWAKI Bellows pumps
Solvent pre-wet reduced resist coat (RRC) nozzle
Side rinse nozzle (Programmable side rinse EBR)
Dual back rinse nozzles
Photo resist temperature control
Motor flange temperature control
Photo resist drain type: Direct gravity drain type
(6) Photo resist bottles in external chemical supply systems
Photo resist auto exchange
Auto dummy dispense system
2-2 Bottom layer coat (BCT) unit:
(3) Bottom layer coat (BCT) dispense nozzles
(3) IWAKI Bellows photo resist pumps
Solvent pre-wet reduced resist coat (RRC) nozzle
Side rinse nozzle (Programmable side rinse EBR)
Dual back rinse nozzle
Photo resist temperature control
Motor flange temperature control
Photo resist drain type: Direct gravity drain type
Photo resist bottle: (6) External photo resist supply system
Photo resist auto exchange
Auto dummy dispense system
Process block robotics arm (PRA)
Adhesion unit (AD)
(5) Hot plate oven units
(2) Dehydration hot plate (DHP) oven units
(2) Cool plate units
Process station block (Spin units):
3-2, 3-3, 3-4 Develop units:
(4) Stream nozzles at (4) Stream nozzle blocks
Rinse nozzles:
(2) Stream type
Spray type
Dual back rinse nozzles
Develop temperature control
Motor flange temperature control
Drain type: Direct gravity drain type
Auto damper
Auto dummy dispense system
Process block robotics (PRA) Arm
Adhesion unit
(3) Hot plate oven units
Dehydration hot plate (DHP) oven unit
(3) Air-purge hot plate (AHP) oven units
(3) Cool plate units
Extension unit
Wafer edge exposure (WEE) unit
Interface station block (IFB):
Interface arm (IFA)
Interface for ASML PAS Series Stepper
(2) Buffers
Pick-up system
Interface cool
Extension stage
Wafer stage
Temperature and humidity controller:
TEAM KOREA TK-TH8T4
2-Cup control capacity for 2 Coat units
External chemical supply system:
Solvent supply system:
Solvent chemical type
CSS Bulk-fill to auto supply system
With (2) Buffer tanks: Auto switch-off / Exchange
Develop supply system:
Develop solution chemical type
CSS Bulk-fill to auto supply system
With (2) Buffer tanks: Auto switch-off / Exchange
Photo resist supply system for 2-1 Coat and 2-2 BCT
6-Bottles of manual supply type
Auto exchange system
HMDS Supply system:
HMDS Chemical type
CSS Bulk-fill to auto supply system with bubbling jar
HMDS Supply system
Themo controller:
External chemical supply system: (2) TEL / TOKYO ELECTRON SMC Multi controller
MAX 16 Channel capacity: 12-Channels for (2) Process
SMC Multi thermo controllers:
(6) SMC Circulators: Chilling channels
2-1 COT Unit
2-2 BCT Unit
Stream nozzle block:
Block 1 and 3: 3-2, 3-3 DEV
Block 2 and 4: 3-4 DEV
(5) Motor flanges
(6) SMC Thermo controllers: Chilling channels
2-9 COL
2-10 COL
3-7 COL
3-11 COL
3-15 COL
4-4 I/F COL
(4) Robots:
CS Arm
(2) Main arm robots
Interface arm
Power transformer AC cabinet: 208 VAC, 3-Phase, 50/60 Hz
1997 vintage.
TEL（TOKYO ELECTRON）TEL/TOKYO ELECTRON CLEan Track Mark 8是一款用于製造电路板的光敏设备。该系统能够进行各种光刻过程，包括旋转涂层、软烘烤、面膜对准、喷涂和硬烘烤。干净的轨道可以实现可重复和准确的结果,从而帮助创造高产率。TEL Clean Track Mark 8旨在帮助减少清洁空间停机时间并提高工作效率。它具有耐用、可靠的防静电底盘和"no-ccd"对齐单元,可将对齐时间缩短一半。此外，该机还配备了触摸面板液晶显示屏，这使得导航工具的功能更加容易。该资产包括两种独特和先进的烘烤技术，以提高清洁度和工艺精度。首先是分裂烘烤，将烘烤过程分成两部分，降低污染风险，优化温度稳定性。二是溷合烘烤，可以完全烘烤晶圆，而不会将基材分离成任务。TOKYO ELECTRON Clean Track Mark 8採用特别设计的喷嘴和清洁剂，能够快速清除抗拒残留物，导致更清洁的晶片，同时大幅减少化学废弃物的产生。特殊的涂层功能可将化学用量和清洁时间减少70%之多,陶瓷头喷嘴有助于减少总颗粒数量,而高精度的无接触跟踪有助于提高对准精度。此外，该模型是可改造的，它允许与各种光刻胶系统兼容。总体而言,Clean Track Mark 8使用先进技术,使用户能够获得可重复和一流的结果,同时最大限度地减少化学品、能源和停机时间的使用。它被设计成一种高效的光敏设备，帮助用户在保持成本效益的生产的同时达到最大产量。
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