二手 TEL / TOKYO ELECTRON Clean Track Mark 8 #9392817 待售
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ID: 9392817
晶圆大小: 8"
优质的: 1995
(2) Coater / (2) Developer system, 8"
Dual blocks
Coater: (3) Nozzles
Developer: E2 Nozzle
Wafer flow: Right to left (CSB Unit right side and interface station left side)
Tank auto switch off / Exchange missing
Block 1:
FC-9821Ke Controller
Stage / Indexer: SMIF / Cassette station
Cassette Station Arm (CSA)
Block 2:
Normal photo resist coater 2-1, 2-2:
(2) Photoresist dispense nozzles per coat unit
(2) Photoresist dispense nozzles and 2-RRC Resist pump per coater
Side rinse nozzle (Programmable side rinse EBR) for normal coater
Dual back rinse nozzle
Photoresist temperature control
Motor flange temperature control
Photoresist drain type: Direct gravity
Photoresist bottle: 2-Space
Photoresist auto exchange
Auto dummy dispense system
Cup type: PP Upper cup and inner cup
Auto damper: Cylinder
Block 3:
Developer 3-1, 3-2 Unit:
Single E2 nozzle
Dual top rinse nozzles
Back rinse nozzles
Developer temperature control
Motor flange temperature control
Drain type: Direct gravity
Auto damper
Auto dummy dispense system
Cup type: Stainless steel for upper and PP for inner
(2) Low temperature ovens (LHP)
(4) Cool plate units
SHINWA Temperature and Humidity Controller (THC): 2-CUP
External chemical supply system:
Section-1: Solvent supply system
Solvent chemical type:
Chemical Center Supply System (CCSS)
With (2) of 3-litres teflon buffer tank
Type: (2) Buffer tanks (3litre/Tank, teflon) (2) Coaters
Tank auto switch off / Exchange
Section 2: Develop:
Develop chemical type
Chemical Center Supply System (CCSS)
With (2) of 3-litres teflon buffer tank to cover (2) DEV Units
Tank auto switch-off / Exchange
HMDS Supply system for 2 AD Unit:
Chemical type
1/4-Gal bottle
With 1L Buffer tank per ADH
SMC Multi controller: Rear mail body
Power transformer AC cabinet : 208 VAC, 3 Phase, 50/60 Hz
ASML
(6) Hot transfer plates: HP3-4 / HP3-5 / HP 3-7 / HP 3-8 / HP2-4 / HP 2-8
(5) Cold transfer plates: COL2-9 / COL2-10 / COL3-6 / COL3-9 / COL3-10
Does not include Hard Disk Drive (HDD)
Missing parts:
CSB Unit:
X, Y, Z Theta motor
Y, Z Motor driver
FFU
COAT 2-1:
EBR Cylinder
Spin chuck
RRC Pump
Spin motor driver
Spin connection board
VAC Sensor
(4) Solenoid valves
COAT 2-2:
EBR Cylinder
Spin chuck
RRC Pump
Spin motor driver
VAC Sensor
(11) Solenoid valves
DEV 3-1:
DEV Spin motor and driver
DI Rinse arm cylinder
Spin unit base assembly
DEV Cup
Spin chuck
Spin connection board
Solenoid valve mainfold
VAC Sensor
D.I Rinse flow meter
(4) Flow meter sensors
DEV 3-2:
DEV Spin motor and driver
DI Rinse arm cylinder
Spin unit base assembly
DEV Cup
Spin chuck
Spin connection board
VAC Sensor
IFB:
Arm assembly
(2) Trabot arms for ASML
Y, Z Motor driver
2-Block system:
FFU
Main arm assembly
Y, Z Motor driver
SIMF Card
TVME Card
(2) AD Units
HP Unit
Circulator pump
(10) DC Power fuses
3-Block system:
FFU
Main arm assembly
Y-Z Motor driver
TVME Card
(2) CP Units
(2) CPL Powers
(3) HP Units
Circulator pump
(10) DC Power fuses
WEE Lamp house
(2) Temperature and humidity controllers
1995 vintage.
TEL/TOKYO ELECTRON CLEan Track Mark 8是一种用于先进半导体器件制造的自动化光刻设备，由TEL开发制造。它是一个集成的高吞吐量系统,提供一致、高质量的生产过程,并提高了速度和准确性。该装置配备了坚固、高效的清洁和涂层技术，旨在最大限度地减少颗粒产生和残留。机器的核心是Clean Track chamber，设计用于将晶片固定到位，确保制造过程中的可重复性。该室采用先进的腔室清洁技术和等离子体处理、化学清洁和先进的涂层技术相结合，以减少颗粒和其他残留物。Mark 8工具还配备了多种自动化功能，包括自动基板传输和处理、自动配方资产、自动基板验证以及对每个处理过的基板进行自动数据记录。该模型能够高精度地处理不同的基材尺寸、基材类型和形状。该设备还采用了先进的喷嘴设计，以利于光刻材料的最佳涂层和喷涂。此外，它还配备了先进的粒子检测系统，以确保颗粒或其他残留物含量高的底物不会进一步加工。TEL Clean Track Mark 8提供了一种低成本、高质量的光刻胶处理解决方桉,适用于一系列不同的先进设备制造工艺。它的模块化设计和组件实现了多功能性和成本效益。先进的气流和湿度控制为光刻涂层提供了理想的环境，自动处理基板最大程度地减少了污染。该系统还通过跟踪基板加工的变化和记录实时数据来实现工艺优化。
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