二手 AMAT / APPLIED MATERIALS Centura 5200 #146830 待售

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图为 已使用的 AMAT / APPLIED MATERIALS Centura 5200 待售
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反应器
製造商
AMAT / APPLIED MATERIALS
模型
Centura 5200
ID: 146830
晶圆大小: 8"
优质的: 1996
DxZ System with 3 Chambers, 8" RF cleaning type Application: CVD Platform Type CENTURA I BODY SBC Board V452 Chamber Type Position A DxZ Nitride Position B DxZ Nitride Position C DxZ Nitride Position D Blank Position E MULTI COOLDOWN Position F CHA - DxZ CHAMBER Chamber Options Process Kit Customer Option Baratron Guage 10Torr / 1Torr Match AE 3155094-003A Heater Lift 0010-38426 RF Generator RFG 2000-2V EPD 0500-01047 Heater Driver 0190-09419 CHB - DxZ CHAMBER Chamber Options Selected Option Process Kit Customer Option Baratron Guage 10Torr / 1Torr Match AE 3155094-003A Heater Lift 0010-38426 RF Generator RFG 2000-2V EPD 0500-01047 Heater Driver 0190-09419 CHC - DxZ CHAMBER Chamber Options Selected Option Process Kit Customer Option Baratron Guage 10Torr / 1Torr Match AE 3155094-003A Heater Lift 0010-38426 RF Generator RFG 2000-2V EPD Heater Driver 0190-09419 CHE - COOLDOWN CHAMBER Type Multi cooldown CHF - (OA) ORIENTER Orienter Standard Gas Delivery Options Pallet Options Component Selection STANDARD Valve Veriflo Transducer MKS Regulator Filter Transducer Displays MFC Type STEC 4400 Gas Panel Pallet A Gas Line Requirement Gas Line Configuration Line 1 Gas NH3 MFC Size 2 SLM Line 2 Gas N2 MFC Size 5SLM Line 3 Gas SiH4 MFC Size 200 SCCM Line 4 Gas NF3 MFC Size 1 SLM Line 5 Gas N2O MFC Size 1 SLM Line 6 Gas CF4 MFC Size 3 SLM Line 7 Gas N20 MFC Size 4V 239.7 SCCM / 2V 119.8SCCM Line 8 Gas N2 MFC Size 5 SLM Line 9 Gas HE MFC Size 5SLM Gas Panel Pallet B Gas Line Requirement Gas Line Configuration Line 1 Gas NH3 MFC Size 2 SLM Line 2 Gas N2 MFC Size 5SLM Line 3 Gas SiH4 MFC Size 200 SCCM Line 4 Gas NF3 MFC Size 1 SLM Line 5 Gas N2O MFC Size 1 SLM Line 6 Gas CF4 MFC Size 3 SLM Line 7 Gas N20 MFC Size 4V 239.7 SCCM / 2V 119.8SCCM Line 8 Gas N2 MFC Size 5 SLM Line 9 Gas HE MFC Size 5SLM Gas Panel Pallet C Gas Line Requirement Gas Line Configuration Line 1 Gas NH3 MFC Size 2 SLM Line 2 Gas N2 MFC Size 5SLM Line 3 Gas SiH4 MFC Size 200 SCCM Line 4 Gas NF3 MFC Size 1 SLM Line 5 Gas N2O MFC Size 1 SLM Line 6 Gas CF4 MFC Size 3 SLM Line 7 Gas N20 MFC Size 4V 239.7 SCCM / 2V 119.8SCCM Line 8 Gas N2 MFC Size 5 SLM Line 9 Gas HE MFC Size 5SLM Transfer Chamber Transfer Ch Manual Lid Hoist YES Robot Type CENTURA HP ROBOT Robot Blade Option Ceramic Blade Remotes Heat Exchanger AMAT 0 Currently stored in a cleanroom 1996 vintage.
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AMAT/APPLIED MATERIALS Centura 5200反应堆是一种先进的等离子体增强化学气相沉积（PE-CVD）系统，为半导体器件制造提供干净、低温的工艺环境。它是一种超高真空、水平运行的反应堆，并通过广泛的CVD工艺配方和材料提供了极致的灵活性。AMAT Centura 5200利用微波频率、离子镀层和等离子体增强反应源，实现了更可控、更可重复的工艺，将薄膜层铺设在基板上，提高了器件性能和可靠性。仪器可以精确精确地控制源气体温度和所需工艺参数的流速，以及基板本身的温度。APPLIED MATERIALS Centura 5200具有多区放热加热炉系统以最大限度地提高生产率,以及在每个反应区精心放置的一组端点传感器,以保证均匀的过程,从而一致形成高质量的薄膜层。最终，均匀的薄膜厚度，伴随着先进的深层剖面分析（DPA）、过程监测和反馈回路，保证了即使是极其复杂的过程的可重复性。增加一个大面积的基板支架提供了以最小的占地面积同时运行两个不同的进程的灵活性。此外,Centura 5200先进的自动RF/DC发电机提供了精确的电源控制,比传统系统更快的加速时间。最后,AMAT/APPLICED MATERIALS Centura 5200包括用户友好的软件,可实现更快的流程设置、结果分析、配方形成等。它已在世界各地的关键实验室进行了广泛的测试和认证，被认为是现有的最先进和最高效的PE-CVD系统之一。
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