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热门产品
AMAT / APPLIED MATERIALS
Centura 5200
System, 6" (3) Chambers Oxide chamber for EMXP+, 6" HP Robot Gas panel: VME1/VME2 MFC/Gas filter mis
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热门产品
AMAT / APPLIED MATERIALS
Centura 5200
Dry oxide etcher Dual process chambers Control Power cabinet Transformer module SEIKO Turbo pump co
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Centura 5200
Dry etch cluster (3) Process chambers RF Supply cabinet containing RFPP LF10A RF Supply RFPP RF20R R
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Centura 5200
CVD System, 8" Process: HPTEOS (2) Loadlocks Robot assembly (3) CVD Deposition chambers Chamber type
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AMAT / APPLIED MATERIALS
Centura 5200
System, 8" (2) MxP Chambers Phase II frame 1995 vintage.
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AMAT / APPLIED MATERIALS
Centura 5200
HDP CVD System, 8" Wafer shape: SNNF Chamber configuration: Chamber A: HDP Ultima plus process cham
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AMAT / APPLIED MATERIALS
Centura 5200
DPS Etcher, 8" Wafer shape: SNNF EMO Type Chamber configuration: Chamber A, B: DPS Metal process ch
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AMAT / APPLIED MATERIALS
Centura 5200
HDP CVD System, 8" Wafer shape: SNNF Chamber configuration: Chamber A: HDP Ultima TE process chambe
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热门产品
AMAT / APPLIED MATERIALS
Centura 5200
HDP CVD System, 8" Wafer shape: SNNF Chamber configuration: Chamber A: HDP Ultima TE process chambe
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AMAT / APPLIED MATERIALS
Centura 5200
HDP CVD System, 8" Ultima TE process chamber Wafer shape: SNNF EMO Type: Turn to release Chamber co
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热门产品
AMAT / APPLIED MATERIALS
Centura 5200
Oxide etcher, 8" Wafer type: SNNF (2) Chambers: MXP Load locks: wide body Software Version: E3.7 Sh
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AMAT / APPLIED MATERIALS
Centura 5200
PVD system, 8" Process capabilities: CVD/Anneal and PVD (3) Chambers Chamber 1: CVD with liquid de
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AMAT / APPLIED MATERIALS
Centura 5200
CVD System, 8" Open cassette (4) WxZ MCVD Chambers Transfer robot: HP Robot (9) Gas channels RF Gen
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AMAT / APPLIED MATERIALS
Centura 5200
Etcher, 8" Cassette nest plastic, 8" Wafer shape: SNNF (Semi notch no flat) System information: Pla
291
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AMAT / APPLIED MATERIALS
Centura 5200
SACVD System, 8" Process: eMax Mainframe AC Power rack Chiller: Buffer chamber Cool down chamber w
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