二手 AMAT / APPLIED MATERIALS Centura 5200 #9006826 待售

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ID: 9006826
晶圆大小: 8"
优质的: 2005
DPS system, 8" Deep Trench chambers For MEMS Wafer: SNNF (Notch) Chamber type: DPS Poly Rev 1 (D1): Ch A, B, C Orienter (OA): Ch F Electrostatic chuck: Ch A, B, C Includes: Mainframe Ch A, B, C System Controller Generator Rack Ac Rack Neslab Neslab Heat Exchange Content Ceramic Dome, Monitor, Light Pen Ep Controller Power Cables Bias Match, Monitor, Tgv Contr. Umbilicals, Power Cable Umbilicals, Power Cable Monitor, Ll Covers, Rough Lines Dtcu Panels Black Noah Controllers Miscellaneous Ch C Umbilicals Neslab And Pump Control Cables Rf Cable, Power Cord Umbilicals Umbilicals Rf Cables Miscellaneous Ch C Miscellaneous Ch C Chiller Noah Neslab Hoses He Metal Hoses Upper Chamber, Process Kit Centrea-01 Endpoint, Optical Fiber Dtcu Cent-01 Facilities orientation: back connection GEM interface present Loadlock type: Narrow body with tilt-out and dummy wafer storage No heated loadlocks with N2 purge Orienter chamber option: Orienter lid hinge present: No Transfer chamber: Wafer on blade detector: basic Robot blade: Nickel coated aluminum Robot type: HP+ Endpoint monitor: Monochromator endpoint present: CHA, CHB, CHC Options: Slit valve for Ch A, B, C RGA Port for Ch A, B, C Alcatel ACT 1300M FOR Ch A and B, Adixen ACT 1300 for ChC Remotes: Software: Legacy, rev. B5.1_25 Controller type: 66" Common controller Umbilicals: Controller to Mainframe Cable Length: 25ft 0150-76869 used on system AC Rack to Mainframe Cable Length: 25ft 0620-00654 used on system Controller to AC Rack Cable Length: 25ft 0150-01981 used on system Pump Interface Cable Length: 50ft RF to Mainframe Cable Length: 50ft RF Generator present for Ch A, B, C Gen rack type: Primary 0010-10156 Generator rack cooling water: Direct to genrack RF Genrack Manifold Faciliites Water Connections: 1/2" compression tube fitting Heat exchanger / chiller type: Steelhead 0: SMC Thermochiller model H2000 1x for Ch A and B for wall Neslab HX 150: NESLAB HX150 for Ch A and B for Cathode Amat 0: N/A Noah POU 3300: Ch C only, for wall, for cathode, for dome Amat 1: N/A Heat exchanger fluid types: DI/Glycol: 50/50 Other: 100% Galden ZT150 Rear frame valve connections: SP1: Wall manifold for Ch A, B, C SP3: Cathode manifold for Ch A, B, C Slot 1 Serial isolator: NA Slot 2 Leak detect/sys reset present Slot 3 Leak detect/sys reset present Slot 4 Empty Slot 5 TC gauge present Slot 6 Conv card CH ABCD present Slot 7 Conv card A/B for LL present Slot 8 Conv card CH C/D present Slot 9 Center find CPU present Slot 10 Empty Slot 11 Empty Slot 12 Floppy drive present Slot 13 Hard drive present Slot 14 Ch A interlock Poly DPS present Slot 15 Ch B interlock poly DPS present Slot 16 Ch C interlock poly DPS present Slot 17 Ch D interlock ASP INT: NA Slot 18 Ch E interlock present Slot 19 M/F interlock present Slot 20 LL Interlock present Slot 21 DI/O1 Ch A present Slot 22 DI/O2 Ch A present Slot 23 DI/O1 Ch B present Slot 24 DI/O2 Ch B present Slot 25 DI/O1 Ch C present Slot 26 DI/O2 Ch C present Slot 27 DI/O1 Ch D: NA Slot 28 DI/O2 Ch D: NA Slot 29 DI/O0 Ch E: NA Slot 30 SBC present Slot 31 Pentium II present Slot 32 Video present Slot 33 I/O Expansion present Slot 34 SEI present Slot 35 CHBR A AIO present Slot 36 CHBR B AIO present Slot 37 CHBR C AIO present Slot 38 CHBR D AIO: NA Slot 39 Mainframe AIO1 present Slot 40 CH E / MF AIO2 present Slot 41 Mainframe DIO1 present Slot 42 Mainframe DIO2 present Slot 43 Mainframe DIO3 present Slot 44 Mainframe DIO4 present Slot 45 Mainframe DIO5 present Slot 46 Mainframe DIO6 present Slot 47 Mainframe stepper 1 present Slot 48 Mainframe stepper 2 present Slot 49 Mainframe stepper 3: NA Slot 50 OMS VX2 present Gas panel: Vertical height: 31". 10 Gas Line positions per Pallet Horizontal Purge Manifold (CI & CII) Valve type: Veriflo Filter type: Millipore Transducer display type: MKS MFC type: AERA FC-D980C Controller type: Standard (VME/VMEII) Facility lines/Gas lines: Multi-line drop Gas configuration: Chamber A: 1 500cc C4F8 2 200cc CF4 6 500cc SF6 8 200cc O2 9 200cc N2-S 10 300cc Ar Chamber B: 1 500cc C4F8 2 200cc CF4 6 500cc SF6 8 200cc O2 9 200cc N2-S 10 300cc Ar Chamber C: 1 500cc C4F8 2 200cc CF4 6 500cc SF6 8 200cc O2 9 200cc N2-S 10 300cc Ar Throttle and Gate Valve: VAT 65046-PH52-AGL1/0215 Pressure Controller: VAT PM-7E Bias Rf Matching Network: ASTEK ATL-100RA/DT2L 500W; P/N AMAT 1110-00033 Chamber A: 409234 rev P27 Chamber B: 409234 rev P27 Chamber C: 410825 rev P27 AMAT # 1110-01063: M/N 3155086-102B TGV assy: 3870-00508 TGV cntrl: 3930-00067 TGV kit: 0242-20395 DTCU assy: 0010-38754 ASSEMBLY, HR DTCU, DPS CHAMBER Chamber Harness: 0140-023 is the Main Chamber Harness section 0140-35790 and 0140-35791 are the two next section at the Lower-Chamber 0140-02362 Cable Crated and Warehoused 2005 vintage.
AMAT/APPLIED MATERIALS Centura 5200反应堆是一种高效、低成本的工具,用于在半导体基板上蚀刻和沉积薄膜。它是一种单晶片、批量运行的工具,具有完全集成的控制器,允许用户轻松控制流程参数和监控性能。AMAT Centura 5200利用三级扩散泵,在每次批次运行中提供更高的泵送速度和降低污染水平,从而产生更好的工艺效果。APPLIED MATERIALS CENTURA 5200有一个坚固的工艺室,允许它处理范围广泛的晶圆直径和气体,范围从25到200 mm晶圆,最多五条气线。反应堆配有互锁设备,使用户可以轻松选择和监控所需参数。此外,该反应堆设计有一个高性能、抗辐射的石英管,带有一个用于蚀刻和沉积过程的单面圆顶,以及一个用于热过程的综合炉。Centura 5200具有强大的闪光灯系统,可提供更高的功耗沉积能力。反应堆能够以每分钟1微米的速率沉积,而蚀刻速率可调至每分钟1.5微米。此外,AMAT/APPLICED MATERIALS Centura 5200配备了嵌入式PCO2控制单元,可控制薄膜厚度和微长宽比。总体而言,AMAT Centura 5200反应堆是一种高效、低成本的装置,用于在半导体基板上蚀刻和沉积薄膜。它可以处理各种晶圆尺寸和气体,具有坚固的加工室和闪光灯机器,可实现更高功率的沉积。高性能石英管、单面圆顶、集成炉使用户能够轻松控制工艺参数和监控性能。
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