二手 AMAT / APPLIED MATERIALS Centura 5200 #9061043 待售

AMAT / APPLIED MATERIALS Centura 5200
ID: 9061043
晶圆大小: 8"
优质的: 1996
Etcher, 8" Cassette nest plastic, 8" Wafer shape: SNNF (Semi notch no flat) System information: Platform type: Centura (3) Process chambers SECS / GEM: Yes Chamber location / Type / Current process: Position A / MxP / Poly etch Position B / MxP / Poly etch Position C / MxP / Poly etch Position F / Orienter (Laser assy not available) Etch chamber: Chamber type: MxP Wafer clamp: Polyimide ESC BS He cooling: Yes He dump line: Yes Turbo pump: SEIKO STP-301CVB Endpoint type: Stand alone Monochrometer: Per chamber Generator model: ENI OEM-12B3 Max power: 1250w Lid temp control: PID Control Gate valve: Heated gate valve Matcher: SMA-1000 Process manometer: MKS 1Torr Gas panel: Manual valve: Yes Transducer: Yes Transducer displays: Yes Regulator: Yes Filter: Yes Gas panel facilities hook up: Single line drop bottom feed (Left side) Exhaust: Top Gas panel door interlock: Yes Gas panel exhaust interlock: Yes Gas panel pallet: Corrosive gas line: (2) Lines per chamber Inert gas line: (6) Lines per chamber MFC type: STEC SEC-7440MC Gas line (gas name, MFC size) ChA Line 1: CL2 / 80 / SEC-7440 Line 2: HBR / 100 / SEC-7440 Line 3: NF3 / 100 / SEC-7440 Line 4: CHF3 / 70 / SEC-7440 Line 5: O2 / 40 / SEC-7440 Line 6: CF4 / 100 / SEC-7440 Line 7: Ar / 100 / SEC-7440 Line 8: N2 / 100 / SEC-7440 ChB Line 1: CL2 / 83 / SEC-7440 Line 2: HBR / 100 / SEC-7440 Line 3: NF3 / 100 / SEC-7440 Line 4: CHF3 / 70 / SEC-7440 Line 5: O2 / 40 / SEC-7440 Line 6: CF4 / 100 / SEC-7440 Line 7: Ar / 100 / SEC-7440 Line 8: N2 / 100 / SEC-7440 ChC: Line 1: CL2 / 80 / SEC-7440 Line 2: HBR / 100 / SEC-7440 Line 3: NF3 / 100 / SEC-7440 Line 4: CHF3 / 70 / SEC-7440 Line 5: O2 / 40 / SEC-7440 Line 6: CF4 / 100 / SEC-7440 Line 7: Ar / 100 / SEC-7440 Line 8: N2 / 100 / SEC-7440 Mainframe: Facilities type: Regulated Loadlock type: Wide body Loadlock auto-rotation: Yes Wafer mapping type: Fast Wafer mapping sensor: Yes Cassette present sensor: Yes Transfer chamber manual lid hoist: Yes Robot type: HP Emo button: Front side Water leak detector: Yes Signal tower (front): Green, yellow, red (2) System monitor displays / controller: Front, remote Remotes: System controller & AC rack EMO button: Yes Smoke detector: Yes Line frequency and voltage: 50/60Hz, 208VAC, 3ph Remote UPS interface: Yes Generator rack EMO button: Yes Smoke detector: Yes Water leak detector: Yes Heat exchanger type: For wall: RISSHI CS-400SW-2 (0 - 80°C) For cathode: RISSHI CS-400SW-2 (0 - 80°C) Pumps type: LL Chamber: EBARA A30W Transfer chamber: EBARA A30W Ch A: EBARA A30W Ch B: EBARA A30W Ch C: EBARA A30W Gas scrubber: EBARA GTE-3 1996 vintage.
AMAT/APPLIED MATERIALS Centura 5200是专门为生产尖端半导体而设计的高性能反应堆。它结合了先进的沉积技术和集成的自动化能力,以实现最佳的过程灵活性和控制。AMAT Centura 5200具有独特的溷合沉积室设计,便于进行积极的过程,允许进行低温和高温反应。由于溷合沉积方法通过减少与交换室相关的停机时间来增加吞吐量,这使得用户能够更快地进行处理。该反应堆允许用户生产更均匀、更一致、吞吐量更高的薄膜。APPLIED MATERIALS Centura 5200还具有许多可用的过程和可定制的软件,允许用户根据其特定要求自定义产品。用户可以使用此软件定制沉积配方和工艺流程,最佳地调整反应堆的功能以满足他们的需求。这也允许用户快速修改和重复流程,以提高流程优化和可靠性。Centura 5200反应堆采用先进的远程诊断系统,能够快速、方便地进行维修和故障排除。集成的自动化控制和诊断系统为用户提供了从研发到生产的各种任务所需的灵活性。这些灵活的控件还使用户能够最大限度地提高吞吐量并实时监控流程参数。此外,AMAT/APPLIED MATERIALS Centura 5200反应堆的设计考虑到安全性。它具有广泛的安全和环境保障措施,包括保护警卫和室内联锁装置,以确保反应堆的运行符合环境条例。AMAT Centura 5200是一个功能广泛的先进反应堆,因此成为市场上最好的高性能反应堆之一。其先进的沉积室设计、集成的自动化功能和灵活的控制使其成为从研发到生产的各种任务的理想解决方桉。
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