二手 AMAT / APPLIED MATERIALS Centura 5200 #9071275 待售
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ID: 9071275
晶圆大小: 8"
Epi Reactor, 8"
Application: Sige Bipolar/BICMOS
Chamber type | Selected option:
Chamber A: (RH) Reduced pressure EPI
Chamber B: (RH) Reduced pressure EPI
Chamber C: (RH) Reduced pressure EPI
Chamber D: Empty
Chamber E: Empty
Chamber F: (CA) Single slot cooldown
EMO Guard ring
Chamber A/B/C:
Thickness control options: Accusett 2
Recipe control software: No
Third manometer: P/N 0220-35949, 200 Torr
Gas line isolation: Yes
Leak check port: None
RGA port and valve: None
Gas delivery options:
ATM Capability in GP Only: No
Gas panel type: Configurable
Gas panel exhaust: Chamber B side
MFC: P/N: 0221-18389, Unit 8561 MFC's
Filter: Millipore
Pump purge: Yes
Chamber A/B/C Gas Option:
SiHCl3: Not applicable
SiH2Cl2: Yes
SiH4: Yes
GEH4: Yes
Direct inject dopant: 2
Mixed dopant 1: Yes
Mixed dopant 2: Yes
Mainframe:
Loadlock type: P/N: 0220-35948 Narrow body load locks with tilt-out
WBLL Equalization: No
Cassette platform type: Universal
Common chamber options:
Variable speed blower: Yes
SW Monitor quartz pyrometer kit: 3
Lamps type: Ushio log life
Susceptors: Tabbed susceptor
Brands: Toshiba
Lift pin type: Hollow silicon carbide
Susceptor support shaft: NCP Susceptor support shaft
Tips: Silicon carbide removable tips
Exhaust inserts: Stainless steel
Lower liners: Non-vented
Pump isolation valve: No
Exhaust deposit reduction: N/A
Transfer chamber:
Wafer sensing: On the fly cneterfinding
Transfer chamber lid hoist: Yes
Robot: HP + ENP
Transfer chamber purge, 15 SLM: Yes
Diagnostics and control:
SECSTrace: Yes
Vacuum pumps:
Pump brand: Edwards
Loadlock chamber pump: Edwards iQDP40
Transfer chamber pump: Edwards iQDP40
Proces chamber pump: Edwards iH1000
Monitors: (1) Through the wall and (1) Table mount
Manual Set
Tools and kits:
Centura HT Temp profiling kit
Upper dome centering ring kit
HT Level 1 Consumable kit
(2) Additional Level 1 consumable kit
Additional Epi quartz and graphite spares:
(2) Reduced pressure upper dome
(2) Lower dome
(4) Spare susceptors
(4) Preheat rings
Manually input spare:
P/N: 3920-01120, 10-120 lb-in torque wrench
480 V with transformer, 60 Hz, 600 A
Currently installed
2005 vintage.
AMAT/APPLIED MATERIALS Centura 5200是一种反应堆设备,设计用于先进的电镀、蚀刻和介电加工应用。它配有高精度的光刻口罩,用于图样处理。该系统旨在快速高效地在大面积的基板上应用物理和化学处理。AMAT Centura 5200采用厚厚的不锈钢外壳构造,提供可靠耐用的防腐蚀和其他环境条件。在外壳内部,采用了最先进的控制模块和机器人传输单元,以确保机器过程的准确性和可重复性。该工具还配备了一系列自动化的泵、阀门和其他运动控制部件,以确保材料的可靠和准确输送。该资产可以容纳多种类型的浴池配置以及多种基材,使其适合各种应用。此外,用户可以根据所处理的材料选择适当的批处理持续时间和过程参数。该模型还支持嵌入式可编程逻辑,使其能够监视和控制特定过程的所有必要参数,从而允许对过程条件进行更多的控制。反应堆提供从RT(室温)到350°C的广泛运行温度,最大流量为175升/分钟;使其适用于高速、高精度的镀层工艺。用户还可以指定自定义参数,例如所需的蒸发速率,并且设备能够检测和存储任何过程结果以供将来参考。APPLIED MATERIALS Centura 5200是一种可靠的反应堆,配备了先进的技术,提供精确、可重复和高效的镀层、蚀刻和介电工艺。它可以很容易地配置为处理许多不同类型的底物和浴池配置,使其成为可靠和多用途的反应堆。
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