二手 AMAT / APPLIED MATERIALS Endura 5500 #9304004 待售

ID: 9304004
晶圆大小: 6"
优质的: 1997
System, 6" MF Facilities: Rear Heat exchanger: NESLAB I Buffer robot type: HP Transfer robot type: HP Hard Disk Drive (HDD): SCSI Buff robot blade: Ceramic Wafer sensor: Mini beam Loadlock type: Narrow body without tilt out Transfer robot blade: Metal Signal tower: 3 Color System umbilicals: 25 ft EMO No GEM No OTF Controller Generator rack (2) CTI-CRYOGENICS 9600 Compressors CTI-CRYOGENICS Motor controller: 3 Phase EBARA A07V Pump Main AC box Transformer: 200 VAC,3 Phase, 50/60 Hz MF Enclousure cover installed MF Gas box Laser assy OB- 8F Cryo pump: Enhanced type Process lift: Motorize type SBC BD Type: V452 Buffer / Transfer: VHP Conversion possible type MF Facility box UPS: Interface type Chamber A: Type: PC-II ADVANCED ENERGY LF10A RF Generator COMDEL CPS1001S RF Generator Gas valves: Nupro Manometer: 100m Torr LEYBOLD Turbovac 361C Pump Lid: Resonator Match box, 6" LEYBOLD Turbotronic 150 / 360 Turbo controller EBARA A07V Pump Gasses: LEYBOLD Turbo pump MFC Size / Gas name / MFC Type 300 / Ar / Stec 4400 20 / Ar / Stec 4400 Chamber B: Type: Cool down Gas valves: Nupro Heater / Cathode cooling: PCW Lid modified to Quartz lid Chamber 1: Process: TTN Type: STD Body Manometer configuration: Single Manometer: 100m Torr No shutter option Lid type: 11.3" ADVANCED ENERGY MDX-L12-650 DC Power supply Susceptor / Pedestal: 101 3-Position gate valve OB-8F Pump: 3 Phase Ion gauge: Nude type Lift type: Basic motorize type Gasses: Gas / MFC Size / Gas name / MFC Type / Qty / Gas stick configuration Gas 1 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds Gas 2 / 100 SCCM / Ar / Stec 4400 / (2) / Manifolds Gas 3 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds Chamber 2: Process: AL Type: STD Body Manometer configuration: Single Manometer: 100m Torr No shutter option Lid type: 11.3" ADVANCED ENERGY MDX-L12M Power supply ADVANCED ENERGY MDX-L12 Power supply Susceptor / Pedestal: 4F Heater / Cathode cooling: NESLAB I 3-Position gate valve OB-8F Pump: 3 Phase MKS Residual gas analyzer installed Lift type: Basic motorize type Gasses: Gas / MFC Size / Gas name / MFC Type / Gas stick configuration Gas 1 / 100 SCCM / Ar / Stec 4400 / Standard Gas 2 / 100 SCCM / Ar / Stec 4400 / Standard Chamber 3: Process: Ti Type: STD Body Manometer configuration: Single Manometer: 100m Torr No shutter option Lid type: 11.3" ADVANCED ENERGY MDX-10K DC Power supply Susceptor / Pedestal: 101 3-Position gate valve OB-8F Pump: 3 Phase Lift type: Basic motorize type Gasses: Gas / MFC Size / Gas name / MFC Type / Qty / Gas stick configuration Gas 1 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds Gas 2 / 100 SCCM / Ar / Stec 4400 / (2) / Manifolds Gas 3 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds Chamber 4: Process: TTN Type: STD Body Manometer configuration: Single Manometer: 100m Torr No shutter option Lid type: 11.3" ADVANCED ENERGY MDX-650 HiZ DC Power supply Susceptor / Pedestal: 101 3-Position gate valve OB-8F Pump: 3 Phase Lift type: Basic motorize type Gasses: Gas / MFC Size / Gas name / MFC Type / Qty / Gas stick configuration Gas 1 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds Gas 2 / 100 SCCM / Ar / Stec 4400 / (2) / Manifolds Gas 3 / 20 SCCM / Ar / Stec 4400 / (2) / Manifolds Missing parts for chamber 1: Drive: 2 Phase Motor Gear box Gear box mount Belt Slot / Top rack boards: 1 / SBC Board 2 / Videl board 3 / OMS Board 4 / DI/O Board 5 / DI/O Board 6 / DI/O Board 7 / DI/O Board 8 / DI/O Board 9 / DI/O Board 10 / SEI Board 11 / No 486C 12 / No seriplex 13 / No DI/O board 14 / No AO board 15 / Stepper board 16 / No spare 17 / No spare 18 / Stepper board 19 / AI Board 20 / AO Board 21 / AO Board 22 / Hard Disk Drive (HDD) 23 / No grounding JAC 24 / Convectron board 25 / Convectron board 26 / Convectron board 27 / Convectron board 28 / No TC 29 / No TC 30 / ION Gauge board 31 / ION Gauge board 32 / No spare 33 / DI/O Board 34 / DI/O Board 35 / DI/O Board 36 / DI/O Board 37 / DI/O Board 38 / No DI/O board 39 / No DI/O board 40 / Floppy Disk Drive (FDD) 41 / No spare 42 / Cryo temp 43 / AI Mux 44 / AI Mux 45 / No AI Mux 46 / No spare 47 / Opto detect board 48 / Opto detect board 49 / Opto detect board 50 / No spare UPS: 200 VAC, 3 Phase, 50/60 Hz, 350 A 1997 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一种高通量、功能齐全的外延反应器,设计用于半导体生产。AKT Endura 5500具有全自动装载机/卸载机和多个处理室,可实现快速的过程设置和优化的过程一致性。AMAT ENDURA 5500旨在为小直径和大直径外延晶片提供高通量。AMAT Endura 5500支持多种工艺化学方法,包括化学气相沉积(CVD)和分子束外延(MBE),用于各种材料的生长,包括硅、硅​​、碳掺杂硅和其他化合物。这种灵活性适应了多种产品的生产,包括传统逻辑器件、MEMS(微机电系统)、高级逻辑和光电元件。该系统具有独特的单源遥控器,简化了流程设置,并允许对最多三个APPLIED MATERIALS ENDURA 5500系统进行全面远程监控。这包括实时访问多个工艺参数,如温度、增长率和工艺压力,此外还允许用户直接公司工艺室。这些数据对于快速查找和排除流程问题非常宝贵。ENDURA 5500提供了多种工艺室配置、受限制的木筏和箱体尺寸,允许快速、高效的晶圆循环和大批量生产。受约束的木筏具有增强的均匀性控制功能,允许以梯田方式铺设晶片,以确保整个晶片的热均匀性一致。使用高度集成的摄像头系统,可以使用四、六、八和十二英寸晶片进行自动晶片对准,从而确保晶片处理和处理的一致性和准确性。APPLIED MATERIALS Endura 5500还拥有一个完全自动化的晶圆处理模块,消除了耗时的手动晶圆处理和加载。这包括Endura 5500的签名旋转卡带传输系统,允许连续自动装卸多达十个晶圆卡带,不间断生产。总体而言,AKT ENDURA 5500是一种顶级的、功能齐全的外延反应堆,专为快速、大容量的晶圆生产而设计。该装置配备了最新的工艺室性能和自动晶片加载,以及远程监控和优化的均匀性控制,所有这些都确保了一致、可靠的生产。
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