二手 TEL / TOKYO ELECTRON NS 300 #293614676 待售
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ID: 293614676
晶圆大小: 12"
优质的: 2006
Wafer scrubber, 12"
Material: Silicon
Utility outlet: Vertical downward
Carrier station block
Carrier stage height: 900 mm
Wafer transport method: Robotics transport method (X, Y, Z, Θ)
Sensor placement sensor
Presence sensor
Mapping sensor
Wafer out sensor
Load port: Bolts / Light
Loader: FOUP
Load port lockout pin: FEOL
Load port indicator
Operator access switch
FOUP Type: (25) Wafers
Kinematic coupling pin
Clamp
Fan Filter Unit (FFU)
AMHS: SHINKO ELCTRIC OHT
I/O Sensor
ES Switch terminal block
Carrier ID reader
Alarm lamp: Red / Blue / Yellow / Green
Direct drain
Digital manometer exhaust monitor
Does not include HDD
Scrubber process station:
Mechanical chuck
Wafer holding method: 6-Pins edge contact method
Wafer fixing method: 3-Points grip method
Wafer sensor
N2 Purge backside liquid contact prevention
Acceleration: 100 to 1,000 rpm (100 rpm/s increment)
Dual band monitor: Alarm rpm bandwidth, stop rpm bandwidth
Alarm / Stop rpm setting range: ±0 to 1,000 rpm
Process recipes: 1000
Recipe steps: 100
Process time setting: 0 to 999.9 sec/step (0.1 sec increment)
Arm: Brush and spray
PVA and PP Brush
Atomized spray nozzle
Flow range: 100 L/min
Basic setting: 0.2 L/min
(2) Side rinse nozzles
ENTEGRIS DIW Filter
Rinse nozzle purge method: Slow leak
ULPA Filter
Rotation speed:
CH2-1, CH2-2: 0, 10 to 3,000 rpm (1 rpm increment)
CH2-3, CH2-4: 0, 10 to 4,000 rpm (1 rpm increment)
AC Power box:
Round terminal for main breaker
Voltage: 208 V
Option:
CCD Camera
Spinner internal lighting
2006 vintage.
TEL/TOKYO ELECTRON NS 300晶圆和掩模洗涤器是一种可靠高效的工具,用于各个行业。TEL NS 300 Wafer&Mask Scrubber主要用于半导体制造及相关行业,为改进制造过程控制和产量提供更清洁的晶片和Mask。TOKYO ELECTRON NS300 Wafer&Mask Scrubber采用小巧、用户友好的设计,在清洁受污染和/或喷涂的晶片、石英面膜、玻璃板等方面非常有效。NS300 Wafer&Mask洗涤器采用120升摇动/洗涤器底部水箱设计,可调节速度以获得最佳清洁效果。洗涤作用通过其旋转搅拌板进行,从各个方向产生均匀的清洁。不仅磨砂装置非常耐用,甚至能够创建干净的表面,而且噪音水平也很安静,完全符合法律规定的水平,因此适合大多数环境。TEL/TOKYO ELECTRON NS300 Wafer&Mask洗涤器配备了温度控制设备和数字显示温度传感器,使用户能够高效、准确地调节温度。洗涤器还配有排水系统、多种不同清洁周期的自动超声波清洗装置、控制排水的自动排水控制机、温度设定和温度控制的精确控制工具。为了满足各种平台的需求,TOKYO ELECTRON NS 300 Wafer&Mask Scrubber还配备了大尺寸的倾斜窗、防振腿、可调空气手枪和各种浸泡解决方桉,因此用户可以灵活地定制工艺以满足其特定要求。总体而言,TEL NS300 Wafer&Mask Scrubber是一款功能强大、用户友好且直观的工具,可在生产过程中节省时间和金钱。其耐用的结构确保了NS 300晶片和掩模洗涤器能够快速有效地清洁晶片和掩模,同时其温度控制资产和精确控制模型进一步提高了工艺可靠性和性能。
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