二手 DNS / DAINIPPON SU-3100 #9099733 待售

Wet station, 12" 25 Wafer FOUP LED Lamp Spin dry with N2 DSP/LAL15+ozone rinse Loadport & FA communication 4 Ports FOUP Transfer system FOUP Opener Opener twice operation Place pin: 4 Pins (Cu exclusive / Mix / Non Cu divided) Foup Wafer slip sensing Wafer counting & mapping system (8) Chambers Wafer transfer system Notch align system (Loader only) Ionizer (Alarm function) Spin unit Chemical supply unit Wafer process flow Spin unit: Chemical chamber 1~8 (DSP/LAL15/O3) N2 Dispenser NANO Spray dispenser Antistatic finish (Static electricity) wafer ground Spin chuck material by chemicals Wafer chucking edge grip : ≤2 mm FDC Compatible Spin speed range: 100 ~ 3000 RPM ± 10 RPM Wafer protection function Separate drain port Chemical return to chemical tank required, Control by recipe Directed chemical rinse drain required, control by recipe Spin chucking sensor SPIN ( increase and decrease) speed required, Control by recipe Chemical attack free spin base inside Wafer & Cup level hard interlock required up/down position hard sensor Chemical chamber 1~8 (DSP / LAL15 / O3 / DIW) Front / Back control Front & back all applications Suck back function Process chemical: DSP/LAL15+Ozone rinse Dispenser (Individual install) Dispenser 1: DSP (H2SO4+H2O2+HF+DIW) Dispenser 2: LAL15 Dispenser 3: Ozone + DIW Dispenser 4: N2 Dispenser 5: Nano spray Chemical flow rate: 0.5 ~ 3.0 LPM± 0.1LPM DIW Flow rate range: 0.5 ~ 3.0 LPM± 0.1LPM Ozone rinse DIW Rinse after chemical process times Wafer cleaning and rinsing required Wafer front and backside 2007 vintage.