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OXFORD Plasmalab 133 #293712618

OXFORD

Plasmalab 133

Reactive Ion Etcher (RIE) ADVANCED ENERGY HiLight 136 RF Generator Chamber: Etching chamber Loadloc
185
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OXFORD Plasmalab 133 #9404282

OXFORD

Plasmalab 133

PECVD System.
220
OXFORD Plasmalab 133 #9151442

OXFORD

Plasmalab 133

Reactive Ion Etcher (RIE) Ion Coupled Plasma Etcher Chamber size: 380 VAT Gate valve with PM5 contr
337
OXFORD Plasmalab 133 #9090816

OXFORD

Plasmalab 133

RIE (FL) Dry etchers FL: Configured for fluorine based chemistry Set up for SiO2 etch Platen: 330 mm
248
OXFORD Plasmalab 133 #9090813

OXFORD

Plasmalab 133

RIE (CL) Dry etchers CL: Configured for chlorine based corrosive chemistry Set up for GaN etch Plat
290
OXFORD Plasmalab 133 #293651582

OXFORD

Plasmalab 133

Reactive Ion Etcher (RIE), 4".
198