10
发现的结果
过滤器
全部清除
过滤器
10 结果
晶圆大小
-
(2)
-
(1)
-
(2)
-
(2)
优质的
-
(1)
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(1)
-
(1)
-
(1)
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(1)
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(1)
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(1)
-
(9)
热门产品
STS / CPX
Multiplex
PECVD System, 4"-8" Gases: N2, N2O, NH3, SiH4, CF4, O2 Temperature range: 0-300°C EDWARDS QDP80 wit
99
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ICP Etcher, 6" Type: Standard rate ASE Does not include turbo pump 1999 vintage.
76
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Etcher, 4" Material used: Gas Gas box QDP80 Pump 900 Turbo pump Chiller RF No ESC Throttle valve Bac
123
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STS / CPX
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Advanced Oxide Etcher (AOE) Loadlock module, 4" AOE Chamber module LEYBOLD Mag-Lev Turbo pump: 2000
326
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ICP AOE system, 4" Load lock Previously used for oxide, pyrex, quartz etching Process gases plumbed:
299
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Cluster ICP etcher, 8″ Brooks VCE4 and Mtr5 robot C033 Cluster handler (2) Temperature controlled li
234
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ICP Etcher (1) Chamber: Poly / Oxide (1) Transfer chamber (1) Vacuum cassette loadlock (2) Process
347
