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PERKIN ELMER
4400
Sputtering system Load lock (3) Sputtering targets, RF / DC Etch station (2) Gas micrometer flow сon
1094
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Sputtering system (4) Magnetrons Load lock Compressed air Chamber heating No turbo pump.
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Sputtering system (4) Targets Etcher and bias deposition Cryo pump Chamber with load lock turbo Auto
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Sputtering system (4) Round targets, 8" EBARA QDP-80 Dry pump Cryo pump Load lock with backing pump
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Sputtering systems With sputter etch capability 8" Round targets Single gas Includes: Delta backing
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Sputtering system, 6" Wafer loading: Manual With load lock Cathodes: Circle shape, 8″ & 4 max Sputt
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Sputtering system PLC Upgrade (3) RF Diode target assemblies Etch Table motor: Encoder for accurate
714
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Sputtering system Up to (3) circular cathodes, 8" Load lock with turbo pump (2) MKS Gas lines.
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