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OXFORD Plasmalab 100 #293660206
热门产品

OXFORD

Plasmalab 100

System With ICP 180 Gases: C4F8, CHF3, SF6 2005 vintage.
74
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OXFORD Plasmalab 100 #293656747
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OXFORD

Plasmalab 100

PECVD System, 8" Process: SiN.
72
OXFORD Plasmalab 100 #293651867
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OXFORD

Plasmalab 100

System Type: ICP 380 2013 vintage.
64
OXFORD Plasmalab 100 #9410020
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OXFORD

Plasmalab 100

ICP Reactive Ion Etcher (RIE), 3"-8" Chamber Low temperature silicon etching system Unique process
112
OXFORD Plasmalab 100 #9258339
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OXFORD

Plasmalab 100

Dry etcher No computer.
107
OXFORD Plasmalab 100 #293591996
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OXFORD

Plasmalab 100

ICP-RIE System LGIT Does not include dry pump.
73
OXFORD Plasmalab 100 #293592017
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OXFORD

Plasmalab 100

PECVD System LGIT Does not include dry pump.
73
OXFORD Plasmalab 100 #293666727
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OXFORD

Plasmalab 100

System.
67
OXFORD Plasmalab 100 #293651581
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OXFORD

Plasmalab 100

ICP System.
77
OXFORD Plasmalab 100 #293649326
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OXFORD

Plasmalab 100

PECVD System.
74
OXFORD Plasmalab 100 #293641059
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OXFORD

Plasmalab 100

ICP System, 6".
54
OXFORD Plasmalab 100 #293636271
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OXFORD

Plasmalab 100

ICP-RIE System.
61
OXFORD Plasmalab 100 #293587250
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OXFORD

Plasmalab 100

ICP Reactive Ion Etcher (RIE) LED Field PECVD.
72
OXFORD Plasmalab 100 #9364612
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OXFORD

Plasmalab 100

PECVD System, 2"-6".
77
OXFORD Plasmalab 100 #9364613
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OXFORD

Plasmalab 100

ICP Etcher, 2"-6".
80
OXFORD Plasmalab 100 #9188881
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OXFORD

Plasmalab 100

ICP Etcher, 6" Currently crated.
68