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OXFORD
Plasmalab 80 Plus
Plasma Enhanced Chemical Vapor Deposition (PECVD) System Gases: Argon, Oxygen, Silane.
516
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OXFORD
Plasmalab 80 Plus
PECVD System, 4"-6" Deposition: SiO2, SiH4 at 300°C No burner gas abatement EDWARDS E2M80 Vacuum pum
498
热门产品
OXFORD
Plasmalab 80 Plus
PECVD System, 4"-6" Deposition: SiNx, SiO2, SiH4 and Si at 300°C EDWARDS E2M80 Vacuum pump Mass Flow
110
热门产品
OXFORD
Plasmalab 80 Plus
Reactive Ion Etcher (RIE), 8" Electrode: 240 mm Gases: Ar, CF4, O2, CHF3, SF6, He Gas flow: 100 SCCM
422
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OXFORD
Plasmalab 80 Plus
Reactive Ion Etcher (RIE) Upgraded to X20 PLC ATP400 HPC Pump RFX600A Generator Gas box Turbo pump M
265